SEMI OpenIR  > 中科院半导体材料科学重点实验室
Epitaxial integration of tetragonal BiFeO3 with silicon for nonvolatile memory applications
Jingbin Zhu; Zhigang Yin; Zhen Fu; Yajuan Zhao; Xingwang Zhang; Xin Liu; Jingbi You; Xingxing Li; Junhua Meng; Heng Liu; Jinliang Wu
2017
Source PublicationJournal of Crystal Growth
Volume459Pages:178–184
Subject Area半导体材料
Indexed BySCI
Date Available2018-06-01
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/28517
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Jingbin Zhu,Zhigang Yin,Zhen Fu,et al. Epitaxial integration of tetragonal BiFeO3 with silicon for nonvolatile memory applications[J]. Journal of Crystal Growth,2017,459:178–184.
APA Jingbin Zhu.,Zhigang Yin.,Zhen Fu.,Yajuan Zhao.,Xingwang Zhang.,...&Jinliang Wu.(2017).Epitaxial integration of tetragonal BiFeO3 with silicon for nonvolatile memory applications.Journal of Crystal Growth,459,178–184.
MLA Jingbin Zhu,et al."Epitaxial integration of tetragonal BiFeO3 with silicon for nonvolatile memory applications".Journal of Crystal Growth 459(2017):178–184.
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