SEMI OpenIR  > 中科院半导体材料科学重点实验室
Epitaxial growth of HfS2 on sapphire by chemical vapor deposition and application for photodetectors
Denggui Wang; Xingwang Zhang; Heng Liu; Junhua Meng; Jing Xia; Zhigang Yin; Ye Wang; Jingbi You; Xiang-Min Meng
2017
Source Publication2D Mater
Volume4Pages:031012
Subject Area半导体材料
Indexed BySCI
Date Available2018-06-01
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/28508
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Denggui Wang,Xingwang Zhang,Heng Liu,et al. Epitaxial growth of HfS2 on sapphire by chemical vapor deposition and application for photodetectors[J]. 2D Mater,2017,4:031012.
APA Denggui Wang.,Xingwang Zhang.,Heng Liu.,Junhua Meng.,Jing Xia.,...&Xiang-Min Meng.(2017).Epitaxial growth of HfS2 on sapphire by chemical vapor deposition and application for photodetectors.2D Mater,4,031012.
MLA Denggui Wang,et al."Epitaxial growth of HfS2 on sapphire by chemical vapor deposition and application for photodetectors".2D Mater 4(2017):031012.
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