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Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition
Zesheng Ji; Lianshan Wang; Guijuan Zhao; Yulin Meng; Fangzheng Li; Huijie Li; Shaoyan Yang; Zhanguo Wang
2017
Source PublicationChinese Physics B
Volume26Issue:7Pages:078102
Subject Area半导体材料
Indexed BySCI
Date Available2018-05-23
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/28309
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Zesheng Ji,Lianshan Wang,Guijuan Zhao,et al. Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition[J]. Chinese Physics B,2017,26(7):078102.
APA Zesheng Ji.,Lianshan Wang.,Guijuan Zhao.,Yulin Meng.,Fangzheng Li.,...&Zhanguo Wang.(2017).Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition.Chinese Physics B,26(7),078102.
MLA Zesheng Ji,et al."Growth and characterization of AlN epilayers using pulsed metal organic chemical vapor deposition".Chinese Physics B 26.7(2017):078102.
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