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Bilayer–metal assisted chemical etching of silicon microwire arrays for photovoltaic applications
R. W. Wu; G. D. Yuan; K. C. Wang; T. B. Wei; Z. Q. Liu; G. H. Wang; J. X. Wang; J. M. Li
2016
Source PublicationAIP Advances
Volume6Issue:2Pages:025324
Subject Area半导体器件
Indexed BySCI
Date Available2017-03-16
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/28094
Collection中科院半导体照明研发中心
Recommended Citation
GB/T 7714
R. W. Wu,G. D. Yuan,K. C. Wang,等. Bilayer–metal assisted chemical etching of silicon microwire arrays for photovoltaic applications[J]. AIP Advances,2016,6(2):025324.
APA R. W. Wu.,G. D. Yuan.,K. C. Wang.,T. B. Wei.,Z. Q. Liu.,...&J. M. Li.(2016).Bilayer–metal assisted chemical etching of silicon microwire arrays for photovoltaic applications.AIP Advances,6(2),025324.
MLA R. W. Wu,et al."Bilayer–metal assisted chemical etching of silicon microwire arrays for photovoltaic applications".AIP Advances 6.2(2016):025324.
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