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Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates
Xu Zhang; Zhi Liu; Chao He; Buwen Cheng; Chunlai Xue; Chuanbo Li; Qiming Wang
2016
Source PublicationJournal of Materials Science: Materials in Electronics
Volume27Issue:9Pages:9341-9345
Subject Area光电子学
Indexed BySCI
Date Available2017-03-16
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/27983
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
Xu Zhang,Zhi Liu,Chao He,et al. Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates[J]. Journal of Materials Science: Materials in Electronics,2016,27(9):9341-9345.
APA Xu Zhang.,Zhi Liu.,Chao He.,Buwen Cheng.,Chunlai Xue.,...&Qiming Wang.(2016).Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates.Journal of Materials Science: Materials in Electronics,27(9),9341-9345.
MLA Xu Zhang,et al."Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates".Journal of Materials Science: Materials in Electronics 27.9(2016):9341-9345.
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