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Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode
Feng Liang; Ping Chen; Degang Zhao; Desheng Jiang; Zongshun Liu; Jianjun Zhu
2016
Source PublicationJournal of Vacuum Science & Technology B
Volume34Issue:1Pages:012201
Subject Area光电子学
Indexed BySCI
Date Available2017-03-10
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/27868
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
Feng Liang,Ping Chen,Degang Zhao,et al. Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode[J]. Journal of Vacuum Science & Technology B,2016,34(1):012201.
APA Feng Liang,Ping Chen,Degang Zhao,Desheng Jiang,Zongshun Liu,&Jianjun Zhu.(2016).Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode.Journal of Vacuum Science & Technology B,34(1),012201.
MLA Feng Liang,et al."Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode".Journal of Vacuum Science & Technology B 34.1(2016):012201.
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