| Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode | |
| Feng Liang; Ping Chen; Degang Zhao; Desheng Jiang; Zongshun Liu; Jianjun Zhu | |
| 2016 | |
| Source Publication | Journal of Vacuum Science & Technology B
 |
| Volume | 34Issue:1Pages:012201 |
| Subject Area | 光电子学 |
| Indexed By | SCI |
| Date Available | 2017-03-10 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/27868 |
| Collection | 光电子研究发展中心 |
| Recommended Citation GB/T 7714 | Feng Liang,Ping Chen,Degang Zhao,et al. Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode[J]. Journal of Vacuum Science & Technology B,2016,34(1):012201. |
| APA | Feng Liang,Ping Chen,Degang Zhao,Desheng Jiang,Zongshun Liu,&Jianjun Zhu.(2016).Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode.Journal of Vacuum Science & Technology B,34(1),012201. |
| MLA | Feng Liang,et al."Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode".Journal of Vacuum Science & Technology B 34.1(2016):012201. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Investigation of bre（1061KB） | 限制开放 | License | Application Full Text | |||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment