Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode | |
Feng Liang; Ping Chen; Degang Zhao; Desheng Jiang; Zongshun Liu; Jianjun Zhu | |
2016 | |
Source Publication | Journal of Vacuum Science & Technology B
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Volume | 34Issue:1Pages:012201 |
Subject Area | 光电子学 |
Indexed By | SCI |
Date Available | 2017-03-10 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/27868 |
Collection | 光电子研究发展中心 |
Recommended Citation GB/T 7714 | Feng Liang,Ping Chen,Degang Zhao,et al. Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode[J]. Journal of Vacuum Science & Technology B,2016,34(1):012201. |
APA | Feng Liang,Ping Chen,Degang Zhao,Desheng Jiang,Zongshun Liu,&Jianjun Zhu.(2016).Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode.Journal of Vacuum Science & Technology B,34(1),012201. |
MLA | Feng Liang,et al."Investigation of breakdown mechanism during field emission process of AlN thin film microscopic cold cathode".Journal of Vacuum Science & Technology B 34.1(2016):012201. |
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