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Mechanical strains in pecvd SiNX:H filmsfor nanophotonic application
O. Semenova; A. Kozelskaya; Li Zhi-Yong; Yu Yu-De
2015
Source PublicationChinese Physics B
Volume24Issue:10Pages:106801
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2016-04-15
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/27043
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
O. Semenova,A. Kozelskaya,Li Zhi-Yong,et al. Mechanical strains in pecvd SiNX:H filmsfor nanophotonic application[J]. Chinese Physics B,2015,24(10):106801.
APA O. Semenova,A. Kozelskaya,Li Zhi-Yong,&Yu Yu-De.(2015).Mechanical strains in pecvd SiNX:H filmsfor nanophotonic application.Chinese Physics B,24(10),106801.
MLA O. Semenova,et al."Mechanical strains in pecvd SiNX:H filmsfor nanophotonic application".Chinese Physics B 24.10(2015):106801.
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