Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes | |
Zhuo Xiong; Tongbo Wei; Yonghui Zhang; Junxi Wang; Jinmin Li | |
2015 | |
Source Publication | Optics Express
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Volume | 24Issue:2Pages:A44-A51 |
Subject Area | 半导体器件 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2016-04-15 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/27006 |
Collection | 中科院半导体照明研发中心 |
Recommended Citation GB/T 7714 | Zhuo Xiong,Tongbo Wei,Yonghui Zhang,et al. Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes[J]. Optics Express,2015,24(2):A44-A51. |
APA | Zhuo Xiong,Tongbo Wei,Yonghui Zhang,Junxi Wang,&Jinmin Li.(2015).Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes.Optics Express,24(2),A44-A51. |
MLA | Zhuo Xiong,et al."Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes".Optics Express 24.2(2015):A44-A51. |
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Multiple-exposure co(2542KB) | 限制开放 | License | Application Full Text |
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