| Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes | |
| Zhuo Xiong; Tongbo Wei; Yonghui Zhang; Junxi Wang; Jinmin Li | |
| 2015 | |
| Source Publication | Optics Express
 |
| Volume | 24Issue:2Pages:A44-A51 |
| Subject Area | 半导体器件 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2016-04-15 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/27006 |
| Collection | 中科院半导体照明研发中心 |
| Recommended Citation GB/T 7714 | Zhuo Xiong,Tongbo Wei,Yonghui Zhang,et al. Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes[J]. Optics Express,2015,24(2):A44-A51. |
| APA | Zhuo Xiong,Tongbo Wei,Yonghui Zhang,Junxi Wang,&Jinmin Li.(2015).Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes.Optics Express,24(2),A44-A51. |
| MLA | Zhuo Xiong,et al."Multiple-exposure colloidal lithography for enhancing light output of GaN-based light-emitting diodes by patterning Ni/Au electrodes".Optics Express 24.2(2015):A44-A51. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Multiple-exposure co（2542KB） | 限制开放 | License | Application Full Text | |||
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