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Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching
Wanyong Li; Yi Luo; Bing Xiong; Changzheng Sun; Lai Wang; Jian Wang; Yanjun Han; Jianchang Yan; Tongbo Wei; Hongxi Lu
2015
Source PublicationPhysica Status Solidi A
Volume212Issue:10Pages:2341–2344
Subject Area半导体器件
Indexed BySCI
Language英语
Date Available2016-04-15
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/27003
Collection中科院半导体照明研发中心
Recommended Citation
GB/T 7714
Wanyong Li,Yi Luo,Bing Xiong,et al. Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching[J]. Physica Status Solidi A,2015,212(10):2341–2344.
APA Wanyong Li.,Yi Luo.,Bing Xiong.,Changzheng Sun.,Lai Wang.,...&Hongxi Lu.(2015).Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching.Physica Status Solidi A,212(10),2341–2344.
MLA Wanyong Li,et al."Fabrication of GaN-based ridge waveguides with very smooth and vertical sidewalls by combined plasma dry etching and wet chemical etching".Physica Status Solidi A 212.10(2015):2341–2344.
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