SEMI OpenIR  > 半导体超晶格国家重点实验室
Optical contrast determination of the thickness of SiO2 film on Si substrate partially covered by two-dimensional crystal flakes
Yan Lu; Xiao-Li Li; Xin Zhang; Jiang-Bin Wu; Ping-Heng Tan
2015
Source PublicationScience Bulletin
Volume60Issue:8Pages:806-811
Subject Area半导体物理
Indexed BySCI
Language英语
Date Available2016-03-29
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26886
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Yan Lu,Xiao-Li Li,Xin Zhang,et al. Optical contrast determination of the thickness of SiO2 film on Si substrate partially covered by two-dimensional crystal flakes[J]. Science Bulletin,2015,60(8):806-811.
APA Yan Lu,Xiao-Li Li,Xin Zhang,Jiang-Bin Wu,&Ping-Heng Tan.(2015).Optical contrast determination of the thickness of SiO2 film on Si substrate partially covered by two-dimensional crystal flakes.Science Bulletin,60(8),806-811.
MLA Yan Lu,et al."Optical contrast determination of the thickness of SiO2 film on Si substrate partially covered by two-dimensional crystal flakes".Science Bulletin 60.8(2015):806-811.
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