SEMI OpenIR  > 半导体超晶格国家重点实验室
Self-induced uniaxial strain in MoS2 monolayers with local van der Waals-stacked interlayer Interactions
Kenan Zhang; Shuhong Hu; Yun Zhang; Tianning Zhang; Xiaohao Zhou; Yan Sun; Tian-Xin Li; Hong Jin Fan; Guozhen Shen; Xin Chen; Ning Dai
2015
Source PublicationACS Nano
Volume9Issue:3Pages:2704-2710
Subject Area半导体物理
Indexed BySCI
Language英语
Date Available2016-03-29
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26874
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Kenan Zhang,Shuhong Hu,Yun Zhang,et al. Self-induced uniaxial strain in MoS2 monolayers with local van der Waals-stacked interlayer Interactions[J]. ACS Nano,2015,9(3):2704-2710.
APA Kenan Zhang.,Shuhong Hu.,Yun Zhang.,Tianning Zhang.,Xiaohao Zhou.,...&Ning Dai.(2015).Self-induced uniaxial strain in MoS2 monolayers with local van der Waals-stacked interlayer Interactions.ACS Nano,9(3),2704-2710.
MLA Kenan Zhang,et al."Self-induced uniaxial strain in MoS2 monolayers with local van der Waals-stacked interlayer Interactions".ACS Nano 9.3(2015):2704-2710.
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