Structural, Raman scattering and magnetic characteristics of Er+-implanted GaN thin films | |
Chao Liu; Xingguo Gao; Dongyan Tao; Junxi Wang; Yiping Zeng | |
2015 | |
Source Publication | Journal of Alloys and Compounds
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Volume | 618Pages:533-536 |
Subject Area | 半导体材料 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2016-03-29 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/26843 |
Collection | 中科院半导体材料科学重点实验室 |
Recommended Citation GB/T 7714 | Chao Liu,Xingguo Gao,Dongyan Tao,et al. Structural, Raman scattering and magnetic characteristics of Er+-implanted GaN thin films[J]. Journal of Alloys and Compounds,2015,618:533-536. |
APA | Chao Liu,Xingguo Gao,Dongyan Tao,Junxi Wang,&Yiping Zeng.(2015).Structural, Raman scattering and magnetic characteristics of Er+-implanted GaN thin films.Journal of Alloys and Compounds,618,533-536. |
MLA | Chao Liu,et al."Structural, Raman scattering and magnetic characteristics of Er+-implanted GaN thin films".Journal of Alloys and Compounds 618(2015):533-536. |
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Structural, Raman sc(416KB) | 限制开放 | License | Application Full Text |
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