SEMI OpenIR  > 中科院半导体材料科学重点实验室
Controlled growth of few-layer hexagonal boron nitride on copper foils using ion beam sputtering
Haolin Wang; Xingwang Zhang; Junhua Meng; Zhigang Yin; Xin Liu; Yajuan Zhao; Liuqi Zhang
2015
Source PublicationSmall
Volume11Issue:13Pages:1542–1547
Subject Area半导体材料
Indexed BySCI
Language英语
Date Available2016-03-23
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26798
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Haolin Wang,Xingwang Zhang,Junhua Meng,et al. Controlled growth of few-layer hexagonal boron nitride on copper foils using ion beam sputtering[J]. Small,2015,11(13):1542–1547.
APA Haolin Wang.,Xingwang Zhang.,Junhua Meng.,Zhigang Yin.,Xin Liu.,...&Liuqi Zhang.(2015).Controlled growth of few-layer hexagonal boron nitride on copper foils using ion beam sputtering.Small,11(13),1542–1547.
MLA Haolin Wang,et al."Controlled growth of few-layer hexagonal boron nitride on copper foils using ion beam sputtering".Small 11.13(2015):1542–1547.
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