| Epitaxial properties of ZnO thin films on LaAlO3 substrates by pulsed laser deposition | |
| C.H. Jia; S.Wang; Y.H.Wu; Y.H.Chen; X.W.Sun; W.F.Zhang | |
| 2015 | |
| Source Publication | Journal of Crystal Growth
 |
| Volume | 421Pages:19–22 |
| Subject Area | 半导体材料 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2016-03-23 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/26778 |
| Collection | 中科院半导体材料科学重点实验室 |
| Recommended Citation GB/T 7714 | C.H. Jia,S.Wang,Y.H.Wu,et al. Epitaxial properties of ZnO thin films on LaAlO3 substrates by pulsed laser deposition[J]. Journal of Crystal Growth,2015,421:19–22. |
| APA | C.H. Jia,S.Wang,Y.H.Wu,Y.H.Chen,X.W.Sun,&W.F.Zhang.(2015).Epitaxial properties of ZnO thin films on LaAlO3 substrates by pulsed laser deposition.Journal of Crystal Growth,421,19–22. |
| MLA | C.H. Jia,et al."Epitaxial properties of ZnO thin films on LaAlO3 substrates by pulsed laser deposition".Journal of Crystal Growth 421(2015):19–22. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Epitaxial properties（360KB） | 限制开放 | License | Application Full Text | |||
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