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Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds
N. I. Fainer; A. A. Nemkova
2015
Source PublicationHigh Energy Chemistry
Volume49Issue:4Pages:273–281
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2016-03-22
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26727
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
N. I. Fainer,A. A. Nemkova. Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds[J]. High Energy Chemistry,2015,49(4):273–281.
APA N. I. Fainer,&A. A. Nemkova.(2015).Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds.High Energy Chemistry,49(4),273–281.
MLA N. I. Fainer,et al."Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds".High Energy Chemistry 49.4(2015):273–281.
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