| Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds | |
| N. I. Fainer; A. A. Nemkova | |
| 2015 | |
| Source Publication | High Energy Chemistry
 |
| Volume | 49Issue:4Pages:273–281 |
| Subject Area | 光电子学 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2016-03-22 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/26727 |
| Collection | 光电子研究发展中心 |
| Recommended Citation GB/T 7714 | N. I. Fainer,A. A. Nemkova. Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds[J]. High Energy Chemistry,2015,49(4):273–281. |
| APA | N. I. Fainer,&A. A. Nemkova.(2015).Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds.High Energy Chemistry,49(4),273–281. |
| MLA | N. I. Fainer,et al."Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds".High Energy Chemistry 49.4(2015):273–281. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Optical Properties o（385KB） | 限制开放 | License | Application Full Text | |||
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