Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds | |
N. I. Fainer; A. A. Nemkova | |
2015 | |
Source Publication | High Energy Chemistry
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Volume | 49Issue:4Pages:273–281 |
Subject Area | 光电子学 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2016-03-22 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/26727 |
Collection | 光电子研究发展中心 |
Recommended Citation GB/T 7714 | N. I. Fainer,A. A. Nemkova. Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds[J]. High Energy Chemistry,2015,49(4):273–281. |
APA | N. I. Fainer,&A. A. Nemkova.(2015).Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds.High Energy Chemistry,49(4),273–281. |
MLA | N. I. Fainer,et al."Optical Properties of Silicon Carbonitride Films Produced by Plasma_Induced Decomposition of Organic Silicon Compounds".High Energy Chemistry 49.4(2015):273–281. |
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Optical Properties o(385KB) | 限制开放 | License | Application Full Text |
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