SEMI OpenIR  > 光电子研究发展中心
Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods
Shishu Lou; Huishi Zhu; Shaoxu Hu; Chunhua Zhao; Peide Han
2015
Source PublicationScientific Reports
Volume5Pages:14084
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2016-03-22
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26689
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
Shishu Lou,Huishi Zhu,Shaoxu Hu,et al. Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods[J]. Scientific Reports,2015,5:14084.
APA Shishu Lou,Huishi Zhu,Shaoxu Hu,Chunhua Zhao,&Peide Han.(2015).Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods.Scientific Reports,5,14084.
MLA Shishu Lou,et al."Investigation of diffusion length distribution on polycrystalline silicon wafers via photoluminescence methods".Scientific Reports 5(2015):14084.
Files in This Item:
File Name/Size DocType Version Access License
Investigation of dif(2174KB) 限制开放LicenseApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Shishu Lou]'s Articles
[Huishi Zhu]'s Articles
[Shaoxu Hu]'s Articles
Baidu academic
Similar articles in Baidu academic
[Shishu Lou]'s Articles
[Huishi Zhu]'s Articles
[Shaoxu Hu]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Shishu Lou]'s Articles
[Huishi Zhu]'s Articles
[Shaoxu Hu]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.