Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure | |
Zhaoxin Geng; Xiangbin Guo; Qiang Kan; Hongda Chen | |
2015 | |
Source Publication | AIP advances
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Volume | 5Issue:4Pages:9-11 |
Subject Area | 光电子学 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2016-03-22 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/26667 |
Collection | 光电子研究发展中心 |
Recommended Citation GB/T 7714 | Zhaoxin Geng,Xiangbin Guo,Qiang Kan,et al. Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure[J]. AIP advances,2015,5(4):9-11. |
APA | Zhaoxin Geng,Xiangbin Guo,Qiang Kan,&Hongda Chen.(2015).Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure.AIP advances,5(4),9-11. |
MLA | Zhaoxin Geng,et al."Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure".AIP advances 5.4(2015):9-11. |
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