SEMI OpenIR  > 光电子研究发展中心
Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure
Zhaoxin Geng; Xiangbin Guo; Qiang Kan; Hongda Chen
2015
Source PublicationAIP advances
Volume5Issue:4Pages:9-11
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2016-03-22
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26667
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
Zhaoxin Geng,Xiangbin Guo,Qiang Kan,et al. Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure[J]. AIP advances,2015,5(4):9-11.
APA Zhaoxin Geng,Xiangbin Guo,Qiang Kan,&Hongda Chen.(2015).Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure.AIP advances,5(4),9-11.
MLA Zhaoxin Geng,et al."Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure".AIP advances 5.4(2015):9-11.
Files in This Item:
File Name/Size DocType Version Access License
Optimization of Subs(9008KB) 限制开放LicenseApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhaoxin Geng]'s Articles
[Xiangbin Guo]'s Articles
[Qiang Kan]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhaoxin Geng]'s Articles
[Xiangbin Guo]'s Articles
[Qiang Kan]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhaoxin Geng]'s Articles
[Xiangbin Guo]'s Articles
[Qiang Kan]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.