| Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure | |
| Zhaoxin Geng; Xiangbin Guo; Qiang Kan; Hongda Chen | |
| 2015 | |
| Source Publication | AIP advances
 |
| Volume | 5Issue:4Pages:9-11 |
| Subject Area | 光电子学 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2016-03-22 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/26667 |
| Collection | 光电子研究发展中心 |
| Recommended Citation GB/T 7714 | Zhaoxin Geng,Xiangbin Guo,Qiang Kan,et al. Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure[J]. AIP advances,2015,5(4):9-11. |
| APA | Zhaoxin Geng,Xiangbin Guo,Qiang Kan,&Hongda Chen.(2015).Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure.AIP advances,5(4),9-11. |
| MLA | Zhaoxin Geng,et al."Optimization of Substrate Conformal Imprint Lithography (SCIL) and Etching for Nanostructure".AIP advances 5.4(2015):9-11. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Optimization of Subs（9008KB） | 限制开放 | License | Application Full Text | |||
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