SEMI OpenIR  > 半导体超晶格国家重点实验室
Synthesis of Bi2S3-Bi2O3 composites and their enhanced photosensitive properties
Lu, FY; Li, RX; Huo, NJ; Yang, JH; Fan, C; Wang, XZ; Yang, SX; Li, JB
2014
Source PublicationRSC ADVANCES
Volume4Issue:11Pages:5666-5670
Subject Area半导体物理
Indexed BySCI
Date Available2015-05-11
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26478
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Lu, FY,Li, RX,Huo, NJ,et al. Synthesis of Bi2S3-Bi2O3 composites and their enhanced photosensitive properties[J]. RSC ADVANCES,2014,4(11):5666-5670.
APA Lu, FY.,Li, RX.,Huo, NJ.,Yang, JH.,Fan, C.,...&Li, JB.(2014).Synthesis of Bi2S3-Bi2O3 composites and their enhanced photosensitive properties.RSC ADVANCES,4(11),5666-5670.
MLA Lu, FY,et al."Synthesis of Bi2S3-Bi2O3 composites and their enhanced photosensitive properties".RSC ADVANCES 4.11(2014):5666-5670.
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