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Impact of CHF3 Plasma Treatment on AlGaN/GaN HEMTs Identified by Low-Temperature Measurement
Du, YD; Han, WH; Yan, W; Yang, FH
2014
Source PublicationCHINESE PHYSICS LETTERS
Volume31Issue:4Pages:048501
Subject Area微电子学
Indexed BySCI
Language英语
Date Available2015-04-02
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26369
Collection半导体集成技术工程研究中心
Recommended Citation
GB/T 7714
Du, YD,Han, WH,Yan, W,et al. Impact of CHF3 Plasma Treatment on AlGaN/GaN HEMTs Identified by Low-Temperature Measurement[J]. CHINESE PHYSICS LETTERS,2014,31(4):048501.
APA Du, YD,Han, WH,Yan, W,&Yang, FH.(2014).Impact of CHF3 Plasma Treatment on AlGaN/GaN HEMTs Identified by Low-Temperature Measurement.CHINESE PHYSICS LETTERS,31(4),048501.
MLA Du, YD,et al."Impact of CHF3 Plasma Treatment on AlGaN/GaN HEMTs Identified by Low-Temperature Measurement".CHINESE PHYSICS LETTERS 31.4(2014):048501.
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