SEMI OpenIR  > 中科院半导体材料科学重点实验室
All-Decision Gate With Extinction Ratio Improved Scheme Using an SOA-DBR Laser
Yu, Li-Qiang; Lu, Dan; Zhao, Ling-Juan
2014
Source PublicationIEEE PHOTONICS TECHNOLOGY LETTERS
Volume26Issue:21Pages:2126-2129
Subject Area半导体材料
Indexed BySCI
Language英语
Date Available2015-03-20
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/26106
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Yu, Li-Qiang,Lu, Dan,Zhao, Ling-Juan. All-Decision Gate With Extinction Ratio Improved Scheme Using an SOA-DBR Laser[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2014,26(21):2126-2129.
APA Yu, Li-Qiang,Lu, Dan,&Zhao, Ling-Juan.(2014).All-Decision Gate With Extinction Ratio Improved Scheme Using an SOA-DBR Laser.IEEE PHOTONICS TECHNOLOGY LETTERS,26(21),2126-2129.
MLA Yu, Li-Qiang,et al."All-Decision Gate With Extinction Ratio Improved Scheme Using an SOA-DBR Laser".IEEE PHOTONICS TECHNOLOGY LETTERS 26.21(2014):2126-2129.
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