SEMI OpenIR  > 中科院半导体材料科学重点实验室
Growth and fabrication of sputtered TiO2 based ultraviolet detectors
Huang, HL; Xie, YN; Zhang, ZF; Zhang, F; Xu, Q; Wu, ZY
2014
Source PublicationAPPLIED SURFACE SCIENCE
Volume293Pages:248-254
Subject Area半导体材料
Indexed BySCI
Language英语
Date Available2015-03-19
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/25963
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Huang, HL,Xie, YN,Zhang, ZF,et al. Growth and fabrication of sputtered TiO2 based ultraviolet detectors[J]. APPLIED SURFACE SCIENCE,2014,293:248-254.
APA Huang, HL,Xie, YN,Zhang, ZF,Zhang, F,Xu, Q,&Wu, ZY.(2014).Growth and fabrication of sputtered TiO2 based ultraviolet detectors.APPLIED SURFACE SCIENCE,293,248-254.
MLA Huang, HL,et al."Growth and fabrication of sputtered TiO2 based ultraviolet detectors".APPLIED SURFACE SCIENCE 293(2014):248-254.
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