Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth | |
Li, Guoxing; Li, Shanwen; Li, Wei; Wang, Xinsheng; Guo, Feng; Zhang, Baolin; Chou, PenChu | |
2014 | |
Source Publication | PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS
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Volume | 507Pages:17-21 |
Subject Area | 半导体器件 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2015-01-29 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/25946 |
Collection | 光电子器件国家工程中心 |
Recommended Citation GB/T 7714 | Li, Guoxing,Li, Shanwen,Li, Wei,et al. Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth[J]. PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS,2014,507:17-21. |
APA | Li, Guoxing.,Li, Shanwen.,Li, Wei.,Wang, Xinsheng.,Guo, Feng.,...&Chou, PenChu.(2014).Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth.PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS,507,17-21. |
MLA | Li, Guoxing,et al."Higher oxidization rate of photo-assisted annealing compared with thermal annealing after YBa2Cu3O7-delta films growth".PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS 507(2014):17-21. |
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Higher oxidization r(962KB) | 限制开放 | License | Application Full Text |
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