SEMI OpenIR  > 中科院半导体材料科学重点实验室
降低衬底表面残留杂质浓度的方法
刘京明; 赵有文; 王凤华; 杨凤云
Rights Holder中国科学院
Date Available2013-04-03 ; 2013-04-03
Country中国
Subtype发明
Subject Area半导体材料
Application Date2012-12-21
Application NumberCN201210564716.5
Document Type专利
Identifierhttp://ir.semi.ac.cn/handle/172111/25172
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
刘京明,赵有文,王凤华,等. 降低衬底表面残留杂质浓度的方法.
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