降低衬底表面残留杂质浓度的方法 | |
刘京明; 赵有文; 王凤华; 杨凤云 | |
Rights Holder | 中国科学院 |
Date Available | 2013-04-03 ; 2013-04-03 |
Country | 中国 |
Subtype | 发明 |
Subject Area | 半导体材料 |
Application Date | 2012-12-21 |
Application Number | CN201210564716.5 |
Document Type | 专利 |
Identifier | http://ir.semi.ac.cn/handle/172111/25172 |
Collection | 中科院半导体材料科学重点实验室 |
Recommended Citation GB/T 7714 | 刘京明,赵有文,王凤华,等. 降低衬底表面残留杂质浓度的方法. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
降低衬底表面残留杂质浓度的方法.pdf(553KB) | 限制开放 | License | Application Full Text |
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