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Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition
Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng
2013
Source PublicationActa Physica Sinica
Volume62Issue:8Pages:086102
Subject Area光电子学
Indexed ByEI
Language英语
Date Available2014-05-16
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24979
Collection集成光电子学国家重点实验室
Recommended Citation
GB/T 7714
Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng. Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition[J]. Acta Physica Sinica,2013,62(8):086102.
APA Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng.(2013).Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition.Acta Physica Sinica,62(8),086102.
MLA Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng."Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition".Acta Physica Sinica 62.8(2013):086102.
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