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Reduced defect density in microcrystalline silicon by hydrogen plasma treatment
Li Jingyan; Zeng Xiangbo; Li Hao; Xie Xiaobing; Yang Ping; Xiao Haibo; Zhang Xiaodong
2013
Source PublicationJournal of Semiconductors
Volume34Issue:10Pages:103006
Subject Area光电子学
Indexed ByEI
Language英语
Date Available2014-05-08
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24932
Collection集成光电子学国家重点实验室
Recommended Citation
GB/T 7714
Li Jingyan,Zeng Xiangbo,Li Hao,et al. Reduced defect density in microcrystalline silicon by hydrogen plasma treatment[J]. Journal of Semiconductors,2013,34(10):103006.
APA Li Jingyan.,Zeng Xiangbo.,Li Hao.,Xie Xiaobing.,Yang Ping.,...&Zhang Xiaodong.(2013).Reduced defect density in microcrystalline silicon by hydrogen plasma treatment.Journal of Semiconductors,34(10),103006.
MLA Li Jingyan,et al."Reduced defect density in microcrystalline silicon by hydrogen plasma treatment".Journal of Semiconductors 34.10(2013):103006.
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