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Study on improving the compactness of SiO2 thin film by PECVD
GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning
2013
Source PublicationJournal of Synthetic Crystals
Volume42Issue:4Pages:577-581
Subject Area光电子学
Indexed ByEI
Language英语
Date Available2014-04-28
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24830
Collection集成光电子学国家重点实验室
Recommended Citation
GB/T 7714
GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning. Study on improving the compactness of SiO2 thin film by PECVD[J]. Journal of Synthetic Crystals,2013,42(4):577-581.
APA GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning.(2013).Study on improving the compactness of SiO2 thin film by PECVD.Journal of Synthetic Crystals,42(4),577-581.
MLA GUO Wen-tao,TAN Man-qing,JIAO Jian,GUO Xiao-feng,SUN Ning-ning."Study on improving the compactness of SiO2 thin film by PECVD".Journal of Synthetic Crystals 42.4(2013):577-581.
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