| Full-Field Strain Mapping at a Ge/Si Heterostructure Interface | |
| Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng | |
| 2013 | |
| Source Publication | Materials
 |
| Volume | 6Issue:6Pages:2130-2142 |
| Subject Area | 光电子学 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2014-04-08 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/24672 |
| Collection | 光电子研究发展中心 |
| Recommended Citation GB/T 7714 | Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng. Full-Field Strain Mapping at a Ge/Si Heterostructure Interface[J]. Materials,2013,6(6):2130-2142. |
| APA | Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng.(2013).Full-Field Strain Mapping at a Ge/Si Heterostructure Interface.Materials,6(6),2130-2142. |
| MLA | Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng."Full-Field Strain Mapping at a Ge/Si Heterostructure Interface".Materials 6.6(2013):2130-2142. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Full-Field Strain Ma（685KB） | 限制开放 | License | Application Full Text | |||
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