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Full-Field Strain Mapping at a Ge/Si Heterostructure Interface
Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng
2013
Source PublicationMaterials
Volume6Issue:6Pages:2130-2142
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2014-04-08
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24672
Collection光电子研究发展中心
Recommended Citation
GB/T 7714
Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng. Full-Field Strain Mapping at a Ge/Si Heterostructure Interface[J]. Materials,2013,6(6):2130-2142.
APA Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng.(2013).Full-Field Strain Mapping at a Ge/Si Heterostructure Interface.Materials,6(6),2130-2142.
MLA Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng."Full-Field Strain Mapping at a Ge/Si Heterostructure Interface".Materials 6.6(2013):2130-2142.
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