Full-Field Strain Mapping at a Ge/Si Heterostructure Interface | |
Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng | |
2013 | |
Source Publication | Materials
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Volume | 6Issue:6Pages:2130-2142 |
Subject Area | 光电子学 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2014-04-08 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/24672 |
Collection | 光电子研究发展中心 |
Recommended Citation GB/T 7714 | Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng. Full-Field Strain Mapping at a Ge/Si Heterostructure Interface[J]. Materials,2013,6(6):2130-2142. |
APA | Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng.(2013).Full-Field Strain Mapping at a Ge/Si Heterostructure Interface.Materials,6(6),2130-2142. |
MLA | Jijun Li, Chunwang Zhao, Yongming Xing, Shaojian Su, Buwen Cheng."Full-Field Strain Mapping at a Ge/Si Heterostructure Interface".Materials 6.6(2013):2130-2142. |
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File Name/Size | DocType | Version | Access | License | ||
Full-Field Strain Ma(685KB) | 限制开放 | License | Application Full Text |
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