SEMI OpenIR  > 中科院半导体材料科学重点实验室
Improvement of the surface quality of semi-insulating InP substrates through a novel etching and cleaning method
Jinming Liu, Youwen Zhao, Zhiyuan Dong, Fengyun Yang, Fenghua Wang
2013
Source PublicationJournal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Volume31Issue:3Pages:031404 - 031404-5
Subject Area半导体材料
Indexed BySCI
Language英语
Date Available2014-03-18
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24518
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Jinming Liu, Youwen Zhao, Zhiyuan Dong, Fengyun Yang, Fenghua Wang. Improvement of the surface quality of semi-insulating InP substrates through a novel etching and cleaning method[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,2013,31(3):031404 - 031404-5.
APA Jinming Liu, Youwen Zhao, Zhiyuan Dong, Fengyun Yang, Fenghua Wang.(2013).Improvement of the surface quality of semi-insulating InP substrates through a novel etching and cleaning method.Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,31(3),031404 - 031404-5.
MLA Jinming Liu, Youwen Zhao, Zhiyuan Dong, Fengyun Yang, Fenghua Wang."Improvement of the surface quality of semi-insulating InP substrates through a novel etching and cleaning method".Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 31.3(2013):031404 - 031404-5.
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