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Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells
Fan, Yujie; Han, Peide; Liang, Peng; Xing, Yupeng; Ye, Zhou; Hu, Shaoxu
2013
Source PublicationAPPLIED SURFACE SCIENCE
Volume264Pages:761-766
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2013-10-10
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24442
Collection集成光电子学国家重点实验室
Recommended Citation
GB/T 7714
Fan, Yujie,Han, Peide,Liang, Peng,et al. Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells[J]. APPLIED SURFACE SCIENCE,2013,264:761-766.
APA Fan, Yujie,Han, Peide,Liang, Peng,Xing, Yupeng,Ye, Zhou,&Hu, Shaoxu.(2013).Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells.APPLIED SURFACE SCIENCE,264,761-766.
MLA Fan, Yujie,et al."Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells".APPLIED SURFACE SCIENCE 264(2013):761-766.
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