| Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells | |
| Fan, Yujie; Han, Peide; Liang, Peng; Xing, Yupeng; Ye, Zhou; Hu, Shaoxu | |
| 2013 | |
| Source Publication | APPLIED SURFACE SCIENCE
 |
| Volume | 264Pages:761-766 |
| Subject Area | 光电子学 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2013-10-10 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/24442 |
| Collection | 集成光电子学国家重点实验室 |
| Recommended Citation GB/T 7714 | Fan, Yujie,Han, Peide,Liang, Peng,et al. Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells[J]. APPLIED SURFACE SCIENCE,2013,264:761-766. |
| APA | Fan, Yujie,Han, Peide,Liang, Peng,Xing, Yupeng,Ye, Zhou,&Hu, Shaoxu.(2013).Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells.APPLIED SURFACE SCIENCE,264,761-766. |
| MLA | Fan, Yujie,et al."Differences in etching characteristics of TMAH and KOH on preparing inverted pyramids for silicon solar cells".APPLIED SURFACE SCIENCE 264(2013):761-766. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2013191.pdf（928KB） | 限制开放 | License | Application Full Text | |||
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