SEMI OpenIR  > 中科院半导体材料科学重点实验室
Formation and Characterization of Multilayer GeSi Nanowires on Miscut Si (001) Substrates
Gong, Hua; Chen, Peixuan; Ma, Yingjie; Wang, Lijun; Rastelli, Armando; Schmidt, Oliver G.; Zhong, Zhenyang
2013
Source PublicationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume13Issue:2Pages:834-838
Subject Area半导体材料
Indexed BySCI
Language英语
Date Available2013-09-22
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24401
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Gong, Hua,Chen, Peixuan,Ma, Yingjie,et al. Formation and Characterization of Multilayer GeSi Nanowires on Miscut Si (001) Substrates[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,2013,13(2):834-838.
APA Gong, Hua.,Chen, Peixuan.,Ma, Yingjie.,Wang, Lijun.,Rastelli, Armando.,...&Zhong, Zhenyang.(2013).Formation and Characterization of Multilayer GeSi Nanowires on Miscut Si (001) Substrates.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,13(2),834-838.
MLA Gong, Hua,et al."Formation and Characterization of Multilayer GeSi Nanowires on Miscut Si (001) Substrates".JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 13.2(2013):834-838.
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