SEMI OpenIR  > 中科院半导体材料科学重点实验室
Surface morphology and infrared absorption of silicon irradiated by picosecond laser pulses in SF6
Liu, Dewei; Huang, Yongguang; Zhu, Xiaoning; Wang, Xiyuan; Yu, Haijuan; Lin, Xuechun; Chen, Minghua; Zhu, Hongliang
2012
Source PublicationAdvanced Materials Research
Volume418-420Pages:77-81
Subject Area半导体材料
Indexed ByEI
Language英语
Date Available2013-05-22
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/24077
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Liu, Dewei,Huang, Yongguang,Zhu, Xiaoning,et al. Surface morphology and infrared absorption of silicon irradiated by picosecond laser pulses in SF6[J]. Advanced Materials Research,2012,418-420:77-81.
APA Liu, Dewei.,Huang, Yongguang.,Zhu, Xiaoning.,Wang, Xiyuan.,Yu, Haijuan.,...&Zhu, Hongliang.(2012).Surface morphology and infrared absorption of silicon irradiated by picosecond laser pulses in SF6.Advanced Materials Research,418-420,77-81.
MLA Liu, Dewei,et al."Surface morphology and infrared absorption of silicon irradiated by picosecond laser pulses in SF6".Advanced Materials Research 418-420(2012):77-81.
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