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Reactive sputtering deposition of Gd-doped AlN thin film
Wu, Rong; Pan, Dong; Jian, Jikang; Li, Jin
2012
Source PublicationAdvanced Materials Research
Volume586Pages:221-224
Subject Area半导体物理
Indexed ByEI
Language英语
Date Available2013-05-07
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/23998
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Wu, Rong,Pan, Dong,Jian, Jikang,et al. Reactive sputtering deposition of Gd-doped AlN thin film[J]. Advanced Materials Research,2012,586:221-224.
APA Wu, Rong,Pan, Dong,Jian, Jikang,&Li, Jin.(2012).Reactive sputtering deposition of Gd-doped AlN thin film.Advanced Materials Research,586,221-224.
MLA Wu, Rong,et al."Reactive sputtering deposition of Gd-doped AlN thin film".Advanced Materials Research 586(2012):221-224.
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