Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films | |
Yu, Ge; Liu, Ya; Hong, Danhong; Li, Donglin; Zang, Jianxin | |
2012 | |
Source Publication | Advanced Materials Research
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Pages | 557-559 |
Subject Area | 半导体材料 |
Indexed By | EI |
Language | 英语 |
Date Available | 2013-05-07 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/23975 |
Collection | 中科院半导体材料科学重点实验室 |
Recommended Citation GB/T 7714 | Yu, Ge,Liu, Ya,Hong, Danhong,et al. Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films[J]. Advanced Materials Research,2012:557-559. |
APA | Yu, Ge,Liu, Ya,Hong, Danhong,Li, Donglin,&Zang, Jianxin.(2012).Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films.Advanced Materials Research,557-559. |
MLA | Yu, Ge,et al."Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films".Advanced Materials Research (2012):557-559. |
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