| Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films | |
| Yu, Ge; Liu, Ya; Hong, Danhong; Li, Donglin; Zang, Jianxin | |
| 2012 | |
| Source Publication | Advanced Materials Research
 |
| Pages | 557-559 |
| Subject Area | 半导体材料 |
| Indexed By | EI |
| Language | 英语 |
| Date Available | 2013-05-07 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/23975 |
| Collection | 中科院半导体材料科学重点实验室 |
| Recommended Citation GB/T 7714 | Yu, Ge,Liu, Ya,Hong, Danhong,et al. Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films[J]. Advanced Materials Research,2012:557-559. |
| APA | Yu, Ge,Liu, Ya,Hong, Danhong,Li, Donglin,&Zang, Jianxin.(2012).Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films.Advanced Materials Research,557-559. |
| MLA | Yu, Ge,et al."Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films".Advanced Materials Research (2012):557-559. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012140.pdf（631KB） | 限制开放 | License | Application Full Text | |||
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