SEMI OpenIR  > 中科院半导体材料科学重点实验室
Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films
Yu, Ge; Liu, Ya; Hong, Danhong; Li, Donglin; Zang, Jianxin
2012
Source PublicationAdvanced Materials Research
Pages557-559
Subject Area半导体材料
Indexed ByEI
Language英语
Date Available2013-05-07
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/23975
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Yu, Ge,Liu, Ya,Hong, Danhong,et al. Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films[J]. Advanced Materials Research,2012:557-559.
APA Yu, Ge,Liu, Ya,Hong, Danhong,Li, Donglin,&Zang, Jianxin.(2012).Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films.Advanced Materials Research,557-559.
MLA Yu, Ge,et al."Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films".Advanced Materials Research (2012):557-559.
Files in This Item:
File Name/Size DocType Version Access License
2012140.pdf(631KB) 限制开放LicenseApplication Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Yu, Ge]'s Articles
[Liu, Ya]'s Articles
[Hong, Danhong]'s Articles
Baidu academic
Similar articles in Baidu academic
[Yu, Ge]'s Articles
[Liu, Ya]'s Articles
[Hong, Danhong]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Yu, Ge]'s Articles
[Liu, Ya]'s Articles
[Hong, Danhong]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.