| Design and fabrication of an InP arrayed waveguide grating for monolithic PICs | |
| Pan, Pan; An, Junming; Wang, Liangliang; Wu, Yuanda; Wang, Yue; Hu, Xiongwei | |
| 2013 | |
| Source Publication | Journal of Semiconductors
 |
| Volume | 33Issue:7Pages:074010 |
| Subject Area | 光电子学 |
| Indexed By | EI |
| Language | 英语 |
| Date Available | 2013-05-07 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/23942 |
| Collection | 集成光电子学国家重点实验室 |
| Recommended Citation GB/T 7714 | Pan, Pan,An, Junming,Wang, Liangliang,et al. Design and fabrication of an InP arrayed waveguide grating for monolithic PICs[J]. Journal of Semiconductors,2013,33(7):074010. |
| APA | Pan, Pan,An, Junming,Wang, Liangliang,Wu, Yuanda,Wang, Yue,&Hu, Xiongwei.(2013).Design and fabrication of an InP arrayed waveguide grating for monolithic PICs.Journal of Semiconductors,33(7),074010. |
| MLA | Pan, Pan,et al."Design and fabrication of an InP arrayed waveguide grating for monolithic PICs".Journal of Semiconductors 33.7(2013):074010. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012241.pdf（267KB） | 限制开放 | License | Application Full Text | |||
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