Design and fabrication of an InP arrayed waveguide grating for monolithic PICs | |
Pan, Pan; An, Junming; Wang, Liangliang; Wu, Yuanda; Wang, Yue; Hu, Xiongwei | |
2013 | |
Source Publication | Journal of Semiconductors
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Volume | 33Issue:7Pages:074010 |
Subject Area | 光电子学 |
Indexed By | EI |
Language | 英语 |
Date Available | 2013-05-07 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/23942 |
Collection | 集成光电子学国家重点实验室 |
Recommended Citation GB/T 7714 | Pan, Pan,An, Junming,Wang, Liangliang,et al. Design and fabrication of an InP arrayed waveguide grating for monolithic PICs[J]. Journal of Semiconductors,2013,33(7):074010. |
APA | Pan, Pan,An, Junming,Wang, Liangliang,Wu, Yuanda,Wang, Yue,&Hu, Xiongwei.(2013).Design and fabrication of an InP arrayed waveguide grating for monolithic PICs.Journal of Semiconductors,33(7),074010. |
MLA | Pan, Pan,et al."Design and fabrication of an InP arrayed waveguide grating for monolithic PICs".Journal of Semiconductors 33.7(2013):074010. |
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