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Two new methods to improve the lithography precision for SU-8 photoresist on glass substrate
Mao, Xu; Yang, Jinling; Ji, An; Yang, Fuhua
2012
Source PublicationProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Pages337-340
Subject Area半导体器件
Indexed ByEI
Language英语
Date Available2013-05-07
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/23941
Collection半导体集成技术工程研究中心
Recommended Citation
GB/T 7714
Mao, Xu,Yang, Jinling,Ji, An,et al. Two new methods to improve the lithography precision for SU-8 photoresist on glass substrate[J]. Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS),2012:337-340.
APA Mao, Xu,Yang, Jinling,Ji, An,&Yang, Fuhua.(2012).Two new methods to improve the lithography precision for SU-8 photoresist on glass substrate.Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS),337-340.
MLA Mao, Xu,et al."Two new methods to improve the lithography precision for SU-8 photoresist on glass substrate".Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS) (2012):337-340.
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