| Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography | |
| Geng C (Geng, Chong); Zheng L (Zheng, Lu); Yu J (Yu, Jie); Yan QF (Yan, Qingfeng); Wei TB (Wei, Tongbo); Wang XQ (Wang, Xiaoqing); Shen DZ (Shen, Dezhong) | |
| 2012 | |
| Source Publication | JOURNAL OF MATERIALS CHEMISTRY
 |
| Volume | 22Issue:42Pages:22678-22685 |
| Subject Area | 光电子学 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2013-04-02 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/23869 |
| Collection | 集成光电子学国家重点实验室 |
| Recommended Citation GB/T 7714 | Geng C ,Zheng L ,Yu J ,et al. Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography[J]. JOURNAL OF MATERIALS CHEMISTRY,2012,22(42):22678-22685. |
| APA | Geng C .,Zheng L .,Yu J .,Yan QF .,Wei TB .,...&Shen DZ .(2012).Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography.JOURNAL OF MATERIALS CHEMISTRY,22(42),22678-22685. |
| MLA | Geng C ,et al."Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography".JOURNAL OF MATERIALS CHEMISTRY 22.42(2012):22678-22685. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012037.pdf（839KB） | 限制开放 | License | Application Full Text | |||
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