Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications | |
Li, ZC; Liu, B; Zhang, R; Zhang, Z; Tao, T; Xie, ZL; Chen, P; Jiang, RL; Zheng, YD; Ji, XL | |
2012 | |
Source Publication | ACTA PHYSICA SINICA
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Volume | 61Issue:8Pages:87802 |
Subject Area | 半导体器件 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2013-03-17 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/23724 |
Collection | 中科院半导体照明研发中心 |
Recommended Citation GB/T 7714 | Li, ZC,Liu, B,Zhang, R,et al. Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications[J]. ACTA PHYSICA SINICA,2012,61(8):87802. |
APA | Li, ZC.,Liu, B.,Zhang, R.,Zhang, Z.,Tao, T.,...&Ji, XL.(2012).Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications.ACTA PHYSICA SINICA,61(8),87802. |
MLA | Li, ZC,et al."Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications".ACTA PHYSICA SINICA 61.8(2012):87802. |
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2012350.pdf(345KB) | 限制开放 | License | Application Full Text |
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