| Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications | |
| Li, ZC; Liu, B; Zhang, R; Zhang, Z; Tao, T; Xie, ZL; Chen, P; Jiang, RL; Zheng, YD; Ji, XL | |
| 2012 | |
| Source Publication | ACTA PHYSICA SINICA
 |
| Volume | 61Issue:8Pages:87802 |
| Subject Area | 半导体器件 |
| Indexed By | SCI |
| Language | 英语 |
| Date Available | 2013-03-17 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/23724 |
| Collection | 中科院半导体照明研发中心 |
| Recommended Citation GB/T 7714 | Li, ZC,Liu, B,Zhang, R,et al. Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications[J]. ACTA PHYSICA SINICA,2012,61(8):87802. |
| APA | Li, ZC.,Liu, B.,Zhang, R.,Zhang, Z.,Tao, T.,...&Ji, XL.(2012).Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications.ACTA PHYSICA SINICA,61(8),87802. |
| MLA | Li, ZC,et al."Design and fabrication of SiO2/Si3N4 dielectric distributed Bragg reflectors for ultraviolet optoelectronic applications".ACTA PHYSICA SINICA 61.8(2012):87802. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2012350.pdf（345KB） | 限制开放 | License | Application Full Text | |||
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