Optimization of the Dielectric Layer Thickness for Surface-Plasmon-Induced Light Absorption for Silicon Solar Cells | |
Xu, R; Wang, XD; Liu, W; Song, L; Xu, XN; Ji, A; Yang, FH; Li, JM | |
2012 | |
Source Publication | JAPANESE JOURNAL OF APPLIED PHYSICS
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Volume | 51Issue:4,Part 1Pages:42301 |
Subject Area | 半导体物理 |
Indexed By | SCI |
Language | 英语 |
Date Available | 2013-03-17 |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/23605 |
Collection | 半导体集成技术工程研究中心 |
Recommended Citation GB/T 7714 | Xu, R,Wang, XD,Liu, W,et al. Optimization of the Dielectric Layer Thickness for Surface-Plasmon-Induced Light Absorption for Silicon Solar Cells[J]. JAPANESE JOURNAL OF APPLIED PHYSICS,2012,51(4,Part 1):42301. |
APA | Xu, R.,Wang, XD.,Liu, W.,Song, L.,Xu, XN.,...&Li, JM.(2012).Optimization of the Dielectric Layer Thickness for Surface-Plasmon-Induced Light Absorption for Silicon Solar Cells.JAPANESE JOURNAL OF APPLIED PHYSICS,51(4,Part 1),42301. |
MLA | Xu, R,et al."Optimization of the Dielectric Layer Thickness for Surface-Plasmon-Induced Light Absorption for Silicon Solar Cells".JAPANESE JOURNAL OF APPLIED PHYSICS 51.4,Part 1(2012):42301. |
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