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Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist
Du, YD; Han, WH; Yan, W; Xu, XN; Zhang, YB; Wang, XD; Yang, FH; Cao, HZ; Jin, F; Dong, XZ; Zhao, ZS; Duan, XM; Liu, Y
2012
Source PublicationOPTICAL ENGINEERING
Volume51Issue:5Pages:54303
Subject Area光电子学
Indexed BySCI
Language英语
Date Available2013-03-17
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/23604
Collection半导体集成技术工程研究中心
Recommended Citation
GB/T 7714
Du, YD,Han, WH,Yan, W,et al. Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist[J]. OPTICAL ENGINEERING,2012,51(5):54303.
APA Du, YD.,Han, WH.,Yan, W.,Xu, XN.,Zhang, YB.,...&Liu, Y.(2012).Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist.OPTICAL ENGINEERING,51(5),54303.
MLA Du, YD,et al."Femtosecond laser lithography technique for submicron T-gate fabrication on positive photoresist".OPTICAL ENGINEERING 51.5(2012):54303.
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