SEMI OpenIR  > 半导体超晶格国家重点实验室
Selection rule of preferred doping site for n-type oxides
Li, C; Li, JB; Li, SS; Xia, JB; Wei, SH
2012
Source PublicationAPPLIED PHYSICS LETTERS
Volume100Issue:26Pages:262109
Subject Area半导体物理
Indexed BySCI
Language英语
Date Available2013-02-07
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/23562
Collection半导体超晶格国家重点实验室
Recommended Citation
GB/T 7714
Li, C,Li, JB,Li, SS,et al. Selection rule of preferred doping site for n-type oxides[J]. APPLIED PHYSICS LETTERS,2012,100(26):262109.
APA Li, C,Li, JB,Li, SS,Xia, JB,&Wei, SH.(2012).Selection rule of preferred doping site for n-type oxides.APPLIED PHYSICS LETTERS,100(26),262109.
MLA Li, C,et al."Selection rule of preferred doping site for n-type oxides".APPLIED PHYSICS LETTERS 100.26(2012):262109.
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