SEMI OpenIR  > 中科院半导体材料科学重点实验室
Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition
Shi K (Shi K.); Zhang PF (Zhang P. F.); Wei HY (Wei H. Y.); Jiao CM (Jiao C. M.); Jin P (Jin P.); Liu XL (Liu X. L.); Yang SY (Yang S. Y.); Zhu QS (Zhu Q. S.); Wang ZG (Wang Z. G.)
2011
Source PublicationJOURNAL OF APPLIED PHYSICS
Volume110Issue:11Pages:113509
Subject Area半导体材料
Date Available2012-02-22
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/22932
Collection中科院半导体材料科学重点实验室
Recommended Citation
GB/T 7714
Shi K ,Zhang PF ,Wei HY ,et al. Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition[J]. JOURNAL OF APPLIED PHYSICS,2011,110(11):113509.
APA Shi K .,Zhang PF .,Wei HY .,Jiao CM .,Jin P .,...&Wang ZG .(2011).Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition.JOURNAL OF APPLIED PHYSICS,110(11),113509.
MLA Shi K ,et al."Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition".JOURNAL OF APPLIED PHYSICS 110.11(2011):113509.
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