| Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition | |
| Shi K (Shi K.); Zhang PF (Zhang P. F.); Wei HY (Wei H. Y.); Jiao CM (Jiao C. M.); Jin P (Jin P.); Liu XL (Liu X. L.); Yang SY (Yang S. Y.); Zhu QS (Zhu Q. S.); Wang ZG (Wang Z. G.) | |
| 2011 | |
| Source Publication | JOURNAL OF APPLIED PHYSICS
 |
| Volume | 110Issue:11Pages:113509 |
| Subject Area | 半导体材料 |
| Date Available | 2012-02-22 |
| Document Type | 期刊论文 |
| Identifier | http://ir.semi.ac.cn/handle/172111/22932 |
| Collection | 中科院半导体材料科学重点实验室 |
| Recommended Citation GB/T 7714 | Shi K ,Zhang PF ,Wei HY ,et al. Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition[J]. JOURNAL OF APPLIED PHYSICS,2011,110(11):113509. |
| APA | Shi K .,Zhang PF .,Wei HY .,Jiao CM .,Jin P .,...&Wang ZG .(2011).Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition.JOURNAL OF APPLIED PHYSICS,110(11),113509. |
| MLA | Shi K ,et al."Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition".JOURNAL OF APPLIED PHYSICS 110.11(2011):113509. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| Thermal diffusion of（571KB） | 限制开放 | License | Application Full Text | |||
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