SEMI OpenIR  > 中科院半导体材料科学重点实验室
VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter
Huang SL; Wu Y; Zhu XF; Li LX; Wang ZG; Wang LZ; Lu GQ; Zhu, XF, Xiamen Univ, China. Australia Joint Lab Funct Nanomat, Xiamen 361005, Peoples R China. zhux@xmu.edu.cn
2011
Source PublicationJOURNAL OF APPLIED PHYSICS
ISSN0021-8979
Volume109Issue:8Pages:Article no.84328
metadata_83[huang, shengli; wu, yan; zhu, xianfang; li, lunxiong; wang, lianzhou; lu, gaoqing] xiamen univ, china australia joint lab funct nanomat, xiamen 361005, peoples r china; [huang, shengli; wu, yan; zhu, xianfang; li, lunxiong; wang, lianzhou; lu, gaoqing] xiamen univ, dept phys, xiamen 361005, peoples r china; [wu, yan] jimei univ, dept phys, xiamen 361021, peoples r china; [zhu, xianfang; wang, zhanguo] chinese acad sci, key lab semicond mat sci, inst semicond, beijing 100083, peoples r china; [zhu, xianfang; wang, lianzhou; lu, gaoqing] univ queensland, arc ctr excellence funct nanomat, brisbane, qld 4072, australia
KeywordSilicon Nanowires Surface Migration Nanostructures Catalyst
Subject Area半导体材料
Funding OrganizationChina-MOST [2008DFA51230]; National Key Basic Science Research Program (973 Project) [2007CB936603]; NSFC [60776007, 11074207]; China Ministry of Education [20100121110023]; SRF for ROCS, SEM
Indexed BySCI
Language英语
Date Available2011-07-05
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/21243
Collection中科院半导体材料科学重点实验室
Corresponding AuthorZhu, XF, Xiamen Univ, China. Australia Joint Lab Funct Nanomat, Xiamen 361005, Peoples R China. zhux@xmu.edu.cn
Recommended Citation
GB/T 7714
Huang SL,Wu Y,Zhu XF,et al. VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter[J]. JOURNAL OF APPLIED PHYSICS,2011,109(8):Article no.84328.
APA Huang SL.,Wu Y.,Zhu XF.,Li LX.,Wang ZG.,...&Zhu, XF, Xiamen Univ, China. Australia Joint Lab Funct Nanomat, Xiamen 361005, Peoples R China. zhux@xmu.edu.cn.(2011).VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter.JOURNAL OF APPLIED PHYSICS,109(8),Article no.84328.
MLA Huang SL,et al."VLS growth of SiOx nanowires with a stepwise nonuniformity in diameter".JOURNAL OF APPLIED PHYSICS 109.8(2011):Article no.84328.
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