Knowledge Management System Of Institute of Semiconductors,CAS
Si(100)-As表面纯化作用和氧吸附 | |
钟战天; 王大文; 范越; 李承芳 | |
1990 | |
Source Publication | 半导体学报
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Volume | 11Issue:2Pages:104 |
metadata_83 | 中科院半导体所;清华大学 |
Subject Area | 半导体化学 |
Indexed By | CSCD |
Language | 中文 |
CSCD ID | CSCD:112399 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/20407 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 钟战天,王大文,范越,等. Si(100)-As表面纯化作用和氧吸附[J]. 半导体学报,1990,11(2):104. |
APA | 钟战天,王大文,范越,&李承芳.(1990).Si(100)-As表面纯化作用和氧吸附.半导体学报,11(2),104. |
MLA | 钟战天,et al."Si(100)-As表面纯化作用和氧吸附".半导体学报 11.2(1990):104. |
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6317.pdf(214KB) | 限制开放 | -- | Application Full Text |
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