SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
多晶硅/CoSi2/Si结构热稳定性研究
陈维德; 金高龙; 崔玉德; 许振嘉
1991
Source Publication半导体学报
Volume12Issue:11Pages:700
metadata_83中科院半导体所
Subject Area半导体材料
Indexed ByCSCD
Language中文
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20317
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
陈维德,金高龙,崔玉德,等. 多晶硅/CoSi2/Si结构热稳定性研究[J]. 半导体学报,1991,12(11):700.
APA 陈维德,金高龙,崔玉德,&许振嘉.(1991).多晶硅/CoSi2/Si结构热稳定性研究.半导体学报,12(11),700.
MLA 陈维德,et al."多晶硅/CoSi2/Si结构热稳定性研究".半导体学报 12.11(1991):700.
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