SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
Light induced rapid thermal diffusion of boron atom in silicon
Shi Wanquan; Hou Qingrun; Liu Xuejun; Liu Shixiang; Fu Zhengqing; Lu Liwn; Li Yuanjing
1992
Source PublicationChinese Physics Letters
Volume9Issue:9Pages:375
metadata_83中国科学技术大学北京研究生院;中科院半导体所
Subject Area半导体材料
Funding Organization国家自然科学基金
Indexed ByCSCD
Language英语
CSCD IDCSCD:167820
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20263
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
Shi Wanquan,Hou Qingrun,Liu Xuejun,et al. Light induced rapid thermal diffusion of boron atom in silicon[J]. Chinese Physics Letters,1992,9(9):375.
APA Shi Wanquan.,Hou Qingrun.,Liu Xuejun.,Liu Shixiang.,Fu Zhengqing.,...&Li Yuanjing.(1992).Light induced rapid thermal diffusion of boron atom in silicon.Chinese Physics Letters,9(9),375.
MLA Shi Wanquan,et al."Light induced rapid thermal diffusion of boron atom in silicon".Chinese Physics Letters 9.9(1992):375.
Files in This Item:
File Name/Size DocType Version Access License
6239.pdf(150KB) 限制开放--Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Shi Wanquan]'s Articles
[Hou Qingrun]'s Articles
[Liu Xuejun]'s Articles
Baidu academic
Similar articles in Baidu academic
[Shi Wanquan]'s Articles
[Hou Qingrun]'s Articles
[Liu Xuejun]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Shi Wanquan]'s Articles
[Hou Qingrun]'s Articles
[Liu Xuejun]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.