SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
不同介质膜的InP MIS结构界面陷阱的研究
卢励吾; 周洁; 瞿伟; 张盛廉
1992
Source Publication半导体学报
Volume13Issue:4Pages:225
metadata_83中科院半导体所
Subject Area半导体材料
Indexed ByCSCD
Language中文
CSCD IDCSCD:168652
Date Available2010-11-23
Citation statistics
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20231
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
卢励吾,周洁,瞿伟,等. 不同介质膜的InP MIS结构界面陷阱的研究[J]. 半导体学报,1992,13(4):225.
APA 卢励吾,周洁,瞿伟,&张盛廉.(1992).不同介质膜的InP MIS结构界面陷阱的研究.半导体学报,13(4),225.
MLA 卢励吾,et al."不同介质膜的InP MIS结构界面陷阱的研究".半导体学报 13.4(1992):225.
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