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O2在FeSi(100)表面的初始吸附研究 | |
丁孙安; 许振嘉 | |
1992 | |
Source Publication | 半导体学报
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Volume | 13Issue:3Pages:147 |
metadata_83 | 中科院半导体所 |
Subject Area | 半导体材料 |
Funding Organization | 国家自然科学基金 |
Indexed By | CSCD |
Language | 中文 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/20223 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 丁孙安,许振嘉. O2在FeSi(100)表面的初始吸附研究[J]. 半导体学报,1992,13(3):147. |
APA | 丁孙安,&许振嘉.(1992).O2在FeSi(100)表面的初始吸附研究.半导体学报,13(3),147. |
MLA | 丁孙安,et al."O2在FeSi(100)表面的初始吸附研究".半导体学报 13.3(1992):147. |
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6219.pdf(256KB) | 限制开放 | -- | Application Full Text |
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