Knowledge Management System Of Institute of Semiconductors,CAS
硅中与钼有关能级的研究 | |
周洁; 卢励吾; 韩志勇; 吴汲安 | |
1992 | |
Source Publication | 半导体学报
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Volume | 13Issue:1Pages:8 |
metadata_83 | 中科院半导体所 |
Subject Area | 半导体材料 |
Indexed By | CSCD |
Language | 中文 |
CSCD ID | CSCD:168717 |
Date Available | 2010-11-23 |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.semi.ac.cn/handle/172111/20209 |
Collection | 中国科学院半导体研究所(2009年前) |
Recommended Citation GB/T 7714 | 周洁,卢励吾,韩志勇,等. 硅中与钼有关能级的研究[J]. 半导体学报,1992,13(1):8. |
APA | 周洁,卢励吾,韩志勇,&吴汲安.(1992).硅中与钼有关能级的研究.半导体学报,13(1),8. |
MLA | 周洁,et al."硅中与钼有关能级的研究".半导体学报 13.1(1992):8. |
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File Name/Size | DocType | Version | Access | License | ||
6212.pdf(176KB) | 限制开放 | -- | Application Full Text |
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