SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
硅化物薄膜的质子弹性散射分析
朱沛然; 江伟林; 徐天冰; 殷士端
1992
Source Publication物理学报
Volume41Issue:12Pages:2049
metadata_83中科院物理所;中科院半导体所
Subject Area半导体材料
Indexed ByCSCD
Language中文
CSCD IDCSCD:187080
Date Available2010-11-23
Citation statistics
Cited Times:2[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20171
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
朱沛然,江伟林,徐天冰,等. 硅化物薄膜的质子弹性散射分析[J]. 物理学报,1992,41(12):2049.
APA 朱沛然,江伟林,徐天冰,&殷士端.(1992).硅化物薄膜的质子弹性散射分析.物理学报,41(12),2049.
MLA 朱沛然,et al."硅化物薄膜的质子弹性散射分析".物理学报 41.12(1992):2049.
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