SEMI OpenIR  > 中国科学院半导体研究所(2009年前)
在微晶硅薄膜中替代式硼杂质的非受主态行为
蒋翔六; 何宇亮; 朱洪亮
1993
Source Publication半导体学报
Volume14Issue:11Pages:664
metadata_83北京市科学技术研究院;北京航空航天大学;中科院半导体所
Subject Area半导体材料
Funding Organization国家自然科学基金
Indexed ByCSCD
Language中文
CSCD IDCSCD:198975
Date Available2010-11-23
Citation statistics
Cited Times:2[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.semi.ac.cn/handle/172111/20145
Collection中国科学院半导体研究所(2009年前)
Recommended Citation
GB/T 7714
蒋翔六,何宇亮,朱洪亮. 在微晶硅薄膜中替代式硼杂质的非受主态行为[J]. 半导体学报,1993,14(11):664.
APA 蒋翔六,何宇亮,&朱洪亮.(1993).在微晶硅薄膜中替代式硼杂质的非受主态行为.半导体学报,14(11),664.
MLA 蒋翔六,et al."在微晶硅薄膜中替代式硼杂质的非受主态行为".半导体学报 14.11(1993):664.
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